ICRP-11 / GEC-2022 / 11th International Conference on Reactive Plasmas / 2022th Gaseous Electronics Conference / 40rd Symposium on Plasma Processing

Award

The Reactive Plasma Award is the highest recognition awarded by the International Organizing Committee of ICRP for outstanding achievements in the field of the fundamentals and applications of reactive plasmas.
We are pleased to recognize Professor Masaru Hori of Nagoya University, Japan, as the recipient of the 2022 Reactive Plasma Award.
Professor Hori has quantitatively measured the gas-phase, surface and Interface reactions of various radicals including atomic radicals in reactive plasmas, systematized their behavior academically, and greatly advanced the fields of semiconductors, materials, and biotechnology through radical-controlled plasma processes.

Masaru Hori

Masaru Hori
Nagoya University, Japan
Reactive Plasma Award Lecture: “Evolution of Reactive Plasma Processes by Radical Control”

About Reactive Plasma Award of ICRP

The first International Conference on Reactive Plasma (ICRP) was held in Nagoya, Japan in July 1991, sponsored by the Japan Society of Applied Physics (JSAP). The ICRP was established to internationalize the domestic annual symposium in Japan, the Symposium on Plasma Processing (SPP), which is managed by the Division of Plasma Electronics (DPE) in JSAP to develop and exchange the knowledge on fundamentals and applications of low temperature plasmas. Since 1991, the ICRPs were held approximately every three years. In commemoration of the 10th ICRP held in 2019, the DPE in JSAP decided to establish the Reactive Plasma Award for outstanding achievements in the field of the fundamentals and applications of reactive plasmas.