ICRP-11 / GEC-2022 / 11th International Conference on Reactive Plasmas / 2022th Gaseous Electronics Conference / 40rd Symposium on Plasma Processing

Workshop - with various session topics and invited speakers

GEC 2022 Workshops - Monday, October 3, 2022

Industrial plasma technologies

Moriya, Tsuyoshi : Tokyo Electron Limited, Japan
New challenges on semiconductor plasma manufacturing

Kim, Jaeho: Samsung Electronics, Korea
Applications of plasma-enhanced deposition technologies in the semiconductor industry

Lee, Dae Hoon: Korea Institute of Machinery and Materials, Korea
Plasma for a clean and carbon-neutral world

Kenney, Jason: Applied Materials, USA
Modeling and simulation of plasmas for etch applications

Ohtake, Hiroto: Hitachi High Technologies America, USA
Thermal cyclic atomic-level etching in 3D ULSI device fabrication

Tatsumi, Tetsuya: Sony Semiconductor Solutions Corporation, Japan
Quantitative control of plasma and surface reactions for dielectric film etching

Plasma physics for space propulsion technologies

Boswell, Rod: Boswell Technologies, Australia
From laboratory to orbit: Mothballs in Space

Merino, Mario: Universidad Carlos III de Madrid, Spain
Electrodeless plasma thrusters and magnetized plasma expansions for space propulsion

Little, Justin: University of Washington, USA
Magnetically expanding plasmas for space propulsion

Fruchtman, Amnon: Holon Institute of Technology, Israel
The effects of collisions and oscillating fields on the thrust in electric propulsion

Mazouffre, Stéphane: CNRS - ICARE laboratory, France
Electron thermodynamics and ion transport in the magnetic nozzle of electrodeless electric thrusters

Kawashima, Rei: Shibaura Institute of Technology, Japan
Anatomy of cross-field electron transport by steady and unsteady plasma structures in Hall thrusters

Cho, Shinatora: Japan Aerospace Exploration Agency, Japan
In-space electric propulsion system enabling JAXA commercial removal of debris demonstration (CRD2): Challenges and relevant physics

Functional surfaces in plasma elementary and process-applicable reactions

Kurahashi, Mitsunori: National Institute for Material Science, Japan
Application of hyperthermal spin- and alignment-controlled O2 beam to surface reaction analysis

Nakamura, Hiroaki: National Institute for Fusion Science, Japan
Integrated simulation for excited hydrogen molecule formed by recombination on carbon surfaces

Ibano, Kenzo: Osaka University, Japan
Fibrous nanostructures formation using helium plasma and their applications as functional materials

Nozaki, Tomohiro: Tokyo Institute of Technology, Japan
Gas reforming by plasma-catalyst coupling

Kim, June Young : Seoul National University, Korea
Kinetic simulation of narrow gap discharge

Stamate, Eugen: Technical University of Denmark, Denmark
Advanced functional thin films for energy conversion and storage devices deposited by plasma-based processes

Catalytic effects in plasma-liquid interaction

Zhou, Renwu: University of Sydney, Australia
Cold atmospheric plasma bubbles: Reactive environments for sustainable processing and activation

Murakami, Tomoyuki: Seikei University, Japan
Graph-based approach to catalytic effects in plasma-exposed liquids

Shimizu, Naohiro: Nagoya University, Japan
Water dessociation by high-power pulse plasma

Bogaerts, Annemie: University of Antwerp, Belgium
Modeling of plasma-liquid interaction